典型文献
Monolayer MoS2 of high mobility grown on SiO2 substrate by two-step chemical vapor deposition
文献摘要:
We report a novel two-step ambient pressure chemical vapor deposition(CVD)pathway to grow high-quality MoS2 monolayer on the SiO2 substrate with large crystal size up to 110 μm.The large specific surface area of the pre-synthesized MoO3 flakes on the mica substrate compared to MoO3 powder could dramatically reduce the consumption of the Mo source.The electronic information inferred from the four-probe scanning tunneling microscope(4P-STM)image explains the threshold voltage variations and the n-type behavior observed in the two-terminal transport measurements.Further-more,the direct van der Pauw transport also confirms its relatively high carrier mobility.Our study provides a reliable method to synthesize high-quality MoS2 monolayer,which is confirmed by the direct 4P-STM measurement results.Such methodology is a key step toward the large-scale growth of transition metal dichalcogenides(TMDs)on the SiO2 substrate and is essential to further development of the TMDs-related integrated devices.
文献关键词:
中图分类号:
作者姓名:
Jia-Jun Ma;Kang Wu;Zhen-Yu Wang;Rui-Song Ma;Li-Hong Bao;Qing Dai;Jin-Dong Ren;Hong-Jun Gao
作者机构:
Institute of Physics,Chinese Academy of Sciences,Beijing 100190,China;School of Physical Sciences,University of Chinese Academy of Sciences,Chinese Academy of Sciences,Beijing 100190,China;CAS Center for Excellence in Topological Quantum Computation,University of Chinese Academy of Sciences,Beijing 100190,China;CAS Key Laboratory of Nanophotonic Materials and Devices,CAS Key Laboratory of Standardization and Measurement for Nano-technology,National Center for Nanoscience and Technology,Beijing 100190,China
文献出处:
引用格式:
[1]Jia-Jun Ma;Kang Wu;Zhen-Yu Wang;Rui-Song Ma;Li-Hong Bao;Qing Dai;Jin-Dong Ren;Hong-Jun Gao-.Monolayer MoS2 of high mobility grown on SiO2 substrate by two-step chemical vapor deposition)[J].中国物理B(英文版),2022(08):203-209
A类:
Pauw
B类:
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AB值:
0.613237
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